Production Rate of SiO Gas from Industrial Quartz and Silicon

Abstract The production rate of SiO gas from industrial quartz and silicon has been investigated by isothermal heat treatment experiments. Mixtures different samples have heated to temperatures ranging 1650 °C 1950 held for 30 120 minutes before cooling. weight loss each sample correlated degree reaction a model the Si + 2 developed based on these values. Five types were used in No significant difference was found their rate, even though there are large variations impurity content, melting decrepitation, phase transformation sample. Further on, it is shown that mixed with various can be described an Arrhenius equation: $${{\rm {d}}\alpha /{\rm {d}}t = k_0 \, A {\rm {exp}} (- Q / RT)}$$ d α / t = k 0 A exp ( - Q R T ) . constant ( k 0 ) equal $${6.25 10^8 {g}}\, {s}}^{-1}\, {\rm{m^{-2}}}}$$ 6.25 10 8 g s 1 m 2 activation energy $${557\, {kJ mol^{-1}}}}$$ 557 kJ mol obtained linear regression. $${\alpha }$$ increasing available area, temperature, time.